Deposition and Etch tools

New craft 6: Environmentally friendly electroless nickel plating. Nickel plating in strict accordance with customer requirements,we can control the accurate thickness.

When it comes to a high quality IR Cut filter, it is the substrate with the coating applied that affects the performance. Knight Optical provide high quality wafers for precisely this, and the surface quality of our substrates eliminates blotching at the sensor which occurs on lower quality substrates especially where IR Cut filters are concerned. Our wafers are produced as thin as 500μm & provide exceptional surface quality. However, we can manufacture to a fully customised specification with a wafer thickness as little as 10 μm. Our substrates for stock or custom can be manufactured from a great deal of materials including: •Quartz •Borosilicate •BK7 or equivalent •Sapphire •And many more. Depending on your application for the IR Cut Filter, we can help advise on the best achievable optic for your application. Please read PDF for full specification

We carry out applied research in our own test field and laboratory in order to constantly further develop our products, but also so as to be able to present our customers with innovative new developments. Furthermore, we regularly participate in cooperative projects of the Federal PhysicalTechnical Institute (PTB PhysikalischTechnische Bundesanstalt) with the economy. We also maintain close cooperative links with the universities of DuisburgEssen and Karlsruhe. We would also like to support you in research with our products. Please contact us.

Plasma systems from Diener electronic have long since established themselves in a wide range of industrial sectors. With the Tretra 320R low-pressure plasma system, you can rely on modern and future-proof cold plasma technology in a vacuum. The chamber volume of approx. 320 litres of this plasma system offers enough space to serve series production / automation. Low pressure plasma treatment is a proven technique for controlled ultra-fine cleaning, adhesion enhancement (activation and etching) and coating of thin films on substrate surfaces. Plasma is generated by applying high-frequency voltage in the vacuum chamber. In the process, the process gas introduced there is ionised. Fields of application: VOC-free cleaning of organic residues Activation before painting, gluing, potting, ... Etching of PTFE, photoresist, oxide layers, ... Super-hydrophobic and -hydrophilic coatings