High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering

Description

Advances in High Power Impulse Magnetron Sputtering (HIPIMS) or High Impact Power Magnetron Sputtering have long been pursued by modifying power supply systems that can deliver short bursts of power densities to a sputtering target. Angstrom Sciences has developed a series of circular sputtering cathodes capable of sustaining continuous power densities greater than 1500 Watts/in2. Angstrom Sciences’ high power pulsed magnetron sputtering cathodes incorporate two additional cooling channels in the anode body and stem tube to maintain optimum cooling during process operation. The magnetic arrangement within the HPP design is specially optimized for high power, magnetic applications. High Power Pulsed circular magnetrons are directly cooled and available in 4", 6", 8" and 10" outer diameters.

Thin coating for integrated circuits
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