RF Sensor with FabGuard Provides Real-time Plasma Process Analysis to Significantly Reduce Process Variability INFICON RF sensor technology provides highly accurate, broadband, frequency discriminant RF measurement for semiconductor processing tools. This RF data provides detailed insight on actual plasma conditions of both process development and production process problems to significantly reduce process variability. The latest in its suite of advanced process control in situ sensors, this non-intrusive in-line cable mount RF sensor combines with FabGuard Sensor Integration and Analysis Systemto offer critical diagnostic information, e.g. accurate chamber and process power and impedance measurement, root cause analysis of faults (such as matching network problems), process fingerprinting for chamber matching, and wafer metrology modeling in PVD, CVD and etch applications. INFICON RF sensor technology with FabGuard generates highly accurate models that predict wafer metrology...

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