Sputtering Targets

Semiconductor Products


The Technical Ceramics business of Morgan Advanced Materials are specialists in the manufacture of ceramic sputtering targets for the semiconductor industry manufactured from 94%-99.99% alumina and CVD silicon carbide (SiC) for physical vapour deposition (PVD) applications. Our alumina sputtering targets are suited to a variety of applications including wear coatings, dielectric coatings and barrier coatings, whereas our CVD SiC sputtering targets are an excellent choice for the deposition of high-purity SiC thin films for demanding applications such as the manufacture of magnetic disk drive heads. Features of our sputtering targets: Controlled microstructures Very high purity, consistency, and uniformity Thermal conductivity that is twice that of sintered SiC Highly resistant to thermal shock Benefits of our sputtering targets include: Sizes to one meter High tolerance ceramic machining/polishing Near net shape processing Our Technical Ceramics engineers work closely with our...

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