ceramic target Rotatable AZO Target
Magnetron sputtering target
Description
Chemical Composition: AZO Molding process: CIP+Sintering+Bonding Purity: ≥5.4g/cm3 Density: ≥ 99.95% Application: Widely used in Thin film solar cell electrode film, Low-e glass film Maximum Machining Size L 4000MM T 5MM Straight & Dogbone Customize to Customers' Specification
- Ceramics, industrial
- Magnetron sputtering target
- ceramic target
- AZO target
Product characteristics
- Purity
- ≥5.4g/cm3
- Density
- ≥ 99.95%
Similar products from XIAMEN NINESUN IMP. & EXP. CO., LTD
XIAMEN NINESUN IMP. & EXP. CO., LTD
China
Mid-frequency magnetron sputtering technology has gradually become the mainstream of sputtering coating technology. Coating: Multi-function metal coating, composite membrane, transparent conductive coating, Increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc. Power supply: DC magnetron sputtering power supply, MF sputtering power supply, high pressure ion bombard power supply. Target: DC magnetron sputtering target, MF twin targets, planner target, cylinder target. Vacuum chamber structure: Vertical signal door, Vertical double doors. Pump system: Molecule pump (diffusion pump)+Roots pump+ Holding pump(optional: turbo pump, poly cold system) Air system: Mass flow controller (1-4road) Ultimate vacuum: 6x10-4pa (no-loading, clean chamber) Pumping time: No-loading from air to 5x10-3pa＜13mins Workplace motion mode: 6 axis/8axis/9axis public and self-rotation