ceramic target Rotatable AZO Target - Magnetron sputtering target

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Description

Chemical Composition: AZO Molding process: CIP+Sintering+Bonding Purity: ≥5.4g/cm3 Density: ≥ 99.95% Application: Widely used in Thin film solar cell electrode film, Low-e glass film Maximum Machining Size L 4000MM T 5MM Straight & Dogbone Customize to Customers' Specification

Product information

Purity
≥5.4g/cm3
Density
≥ 99.95%