PLANSEE SE
Austria
Aluminum is used for PVD metallization in thin-film transistors for TFT-LCD for displays. Aluminum sputtering targets are highly pure and therefore ensure best conductivity of the material. The aluminum targets have a particularly fine-grained microstructure. This ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process. Material properties: Density [g/cm3]: > 2,70 Purity [%] > 99,999 (5N) Hardness [HV1]: 16 Thermal conductivity [W/(m·K)]: 238
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SHENZHEN HAOXIN TECHNOLOGY DEVELOPMENT CO., LTD.
China
SHENZHEN HAOXIN TECHNOLOGY DEVELOPMENT CO., LTD.
China
SHENZHEN HAOXIN TECHNOLOGY DEVELOPMENT CO., LTD.
China
SHENZHEN HAOXIN TECHNOLOGY DEVELOPMENT CO., LTD.
China
SHENZHEN HAOXIN TECHNOLOGY DEVELOPMENT CO., LTD.
China
SHENZHEN HAOXIN TECHNOLOGY DEVELOPMENT CO., LTD.
China
SHENZHEN HAOXIN TECHNOLOGY DEVELOPMENT CO., LTD.
China
SHENZHEN HAOXIN TECHNOLOGY DEVELOPMENT CO., LTD.
China
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